Features
Skin type: Sensitive skin, Dry skin
Description
Cream mask in a balanced composition of biotechnological active ingredients. The skin's own defense system should be strengthened and irritated, irritated skin soothed.
IMMUN - for all skin types and all ages
Special, biotechnological active ingredients of the latest generation can ward off damaging influences, support the reconstruction of the skin's own protective function and counteract the premature skin aging process.
Manufacturer information
KLAPP COSMETICS GmbH, Klapp-Allee 1-5, D-37235 Hessisch Lichtenau | info@klapp-cosmetics.com | www.klapp-skincare.com
Ingredients
AQUA/WATER/EAU, OCTYLDODECANOL, GLYCERYL STEARATE, MYRISTYL ALCOHOL, ISOPROPYL STEARATE, PENTYLENE GLYCOL, PEG-30 STEARATE, LANOLIN, SORBITOL, GLYCERIN, OLEYL ERUCATE, CETEARETH-12, CETYL ALCOHOL, BUTYROSPERMUM PARKII (SHEA BUTTER), SESAMUM INDICUM (SESAME) SEED OIL, PANTHENOL, TOCOPHERYL ACETATE, DIMETHICONE, CAPRYLIC/CAPRIC TRIGLYCERIDE, LANOLIN ALCOHOL, FRAGRANCE (PARFUM), KRAMERIA TRIANDRA ROOT EXTRACT, PHENOXYETHANOL, METHYLPARABEN, SODIUM LACTATE, LACTIC ACID, SERINE, TEA-LACTATE, UREA, TEPRENONE, CITRIC ACID, SODIUM CHLORIDE, GLYCINE SOJA (SOYBEAN) PROTEIN, SUPEROXIDE DISMUTASE, SODIUM HYDROXIDE, SODIUM DEXTRAN SULFATE, ALLANTOIN, ETHYLHEXYLGLYCERIN, BHT, ETHYLPARABEN, BUTYLPARABEN, PROPYLPARABEN, SODIUM BENZOATE, POTASSIUM SORBATE, EUGENOL, HYDROXYCITRONELLAL, LINALOOL, CITRONELLOL, HEXYL CINNAMAL, ALPHA-ISOMETHYL IONONE
The ingredients listed correspond to the current state of production. New scientific findings are regularly incorporated into the recipes.
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